Nanowires / Nanoobjects

Nanowires by metal-assisted etching

Abstract

People

Publications

2012

Geyer, N. , B. Fuhrmann , Z. Huang , J. Boor , H. S. Leipner , and P. Werner
Model for the mass transport during metal-assisted chemical etching with contiguous metal films as catalysts.
Journal of Physical Chemistry C 116 (24) , p 13446-13451 (2012)

Homonnay, N. , N. Geyer , B. Fuhrmann , and H. S. Leipner
Advanced colloidal lithography for sub-100 nm lift-off structures.
Vacuum 86 (9) , p 1232-1234 (2012)

2011

Ou, X. , N. Geyer , R. Kögler , P. Werner , and W. Skorupa
Acceptor deactivation in individual silicon nanowires: From thick to ultrathin.
Applied Physics Letters 98 (25) , p 253103/1-3 (2011)

Huang, Z. , L. F. Liu , and N. Geyer
Quasi-radial growth of metal tube on Si nanowires template.
Nanoscale Research Letters 6 , p 165/1-8 (2011)

Huang, Z. , N. Geyer , P. Werner , J. Boor , and U. Gösele
Metal-assisted chemical etching of silicon: A review.
Advanced Materials 23 (2) , p 285-308 (2011)

2010

Huang, Z. , N. Geyer , L. F. Liu , M. Y. Li , and P. Zhong
Metal-assisted electrochemical etching of silicon.
Nanotechnology 21 (46) , p 465301/1-6 (2010)

Huang, Z. , T. Shimizu , S. Senz , Z. Zhang , N. Geyer , and U. Gösele
Oxidation rate effect on the direction of metal-assisted chemical and electrochemical etching of silicon.
Journal of Physical Chemistry C 114 (24) , p 10683-10690 (2010)

Boor, J. , N. Geyer , J. V. Wittemann , U. Gösele , and V. Schmidt
Sub-100 nm silicon nanowires by laser interference lithography and metal-assisted etching.
Nanotechnology 21 (9) , p 095302/1-5 (2010)

Wolfsteller, A. , N. Geyer , T.-K. Nguyen-Duc , P. Das-Kanungo , N. D. Zakharov , M. Reiche , W. Erfurth , H. Blumtritt , S. Kalem , P. Werner , and U. Gösele
Comparison of the top-down and bottom-up approach to fabricate nanowire-based silicon/germanium heterostructures.
Thin Solid Films 518 (9) , p 2555-2561 (2010)

2009

Geyer, N. , Z. P. Huang , B. Fuhrmann , S. Grimm , M. Reiche , T.-K. Nguyen-Duc , J. Boor , H. S. Leipner , P. Werner , and U. Gösele
Sub-20 nm Si/Ge superlattice nanowires by metal-assisted etching.
Nano Letters 9 (9) , p 3106-3110 (2009)

2008

Huang, Z. P. , X. X. Zhang , M. Reiche , L. F. Liu , W. Lee , T. Shimizu , S. Senz , and U. Gösele
Extended arrays of vertically aligned sub-10 nm diameter [100] Si nanowires by metal-assisted chemical etching.
Nano Letters 8 (9) , p 3046-3051 (2008)

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